• Brooks GF121 Mass Flow Controllers

Brooks GF121 Mass Flow Controllers

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Pilihan yang tersedia

Rp.75.750.000
Ketersediaan:
4 - 6 MINGGU
Kode Produk:
GF102CXXC-SH51 055L-V1AOG1-XXXXAA000
Merk:
Brooks Instruments
Update Terakhir:
13 May 2017

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  • Money back guarantee

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The Brooks GF101 / GF121 / GF126 Mass Flow Controllers are designed for semiconductor, MOCVD, and other gas flow control applications that require a high purity all-metal flow path. The GF101/ GF121 / GF126 support flow rates up to 300 slpm N2 equivalent. The high flow design utilizes the GF sensor design and electronics. This high flow product provides excellent flow stability for purge lines in CVD, LPCVD, Diffusion, Epi processes, semiconductor chamber clean processes, and MOCVD purge flows.

Applications for the GF101 / GF121 / GF126 Flow Controllers include:
  • Semiconductor etch tools
  • Thin-film chemical vapor deposition systems (CVD, MOCVD, PECVD, ALD)
  • Physical vapor deposition (PVD) systems
  • Epitaxial process systems


Features:


  • Flow rates up to 300 slpm
  • 1% accuracy
  • Corrosion resistant hastelloy C-22 sensor tube
  • Metal seal
  • Less than 1 second response time
  • Control range: 5-100% (normally closed valve)
  • Pressure Transient Insensitivity (PTI)


What's In The Box:
  • (1) User Manual


Brochure/Datasheet
Instruction manual


Catatan: Harga tidak mengikat, sewaktu waktu bisa berubah tanpa pemberitahuan dahulu

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